---
title: Advanced Cleans – Post Etch Cleans
description: JSR Chemical Cleaning Solutions with low particle and high-quality raw materials provide the state-of-the-art Cleaning technology which high selective etch or cleaning is required on Metal / Non-Metal layers.    
---

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# Advance Cleans - Post Etch Cleans

[![Request info](https://no-cache.hubspot.com/cta/default/6648009/58588403-3b46-4bec-b4e7-e7f68d4bb653.png)](https://cta-redirect.hubspot.com/cta/redirect/6648009/58588403-3b46-4bec-b4e7-e7f68d4bb653)

JSR Chemical Cleaning Solutions with low particle and high-quality raw materials provide the state-of-the-art Cleaning technology which high selective etch or cleaning is required on Metal / Non-Metal layers.    

![](https://www.jsrmicro.com/hubfs/image-png-2.png)**

 

***![](https://www.jsrmicro.com/hubfs/image-png-Apr-26-2021-10-33-52-66-PM.png)***

**Example Application of JC-001A**

***![](https://www.jsrmicro.com/hubfs/image-png-4.png)***

***![](https://www.jsrmicro.com/hs-fs/hubfs/image-png-Apr-26-2021-10-31-08-77-PM.png?width=654&name=image-png-Apr-26-2021-10-31-08-77-PM.png)***

![](https://www.jsrmicro.com/hubfs/image-png-Jun-01-2021-08-34-26-01-PM.png)

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**Residue Removability**

***![](https://www.jsrmicro.com/hs-fs/hubfs/image-png-Apr-26-2021-10-38-26-23-PM.png?width=573&name=image-png-Apr-26-2021-10-38-26-23-PM.png)***

**Complete Residue Removal**

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**Defectivity**

![](https://www.jsrmicro.com/hs-fs/hubfs/image-png-Apr-26-2021-10-43-26-76-PM.png?width=351&name=image-png-Apr-26-2021-10-43-26-76-PM.png)

**> 19nm Wafer Particle **

**< 10 Counts/Wafer**

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**Metal Compatibility**

**Corrosion Inhibitor Selection**

![](https://www.jsrmicro.com/hs-fs/hubfs/image-png-May-03-2021-10-28-08-25-PM.png?width=624&name=image-png-May-03-2021-10-28-08-25-PM.png)

**Corrosion Potential Control**

**![](https://www.jsrmicro.com/hs-fs/hubfs/image-png-Apr-26-2021-11-09-32-21-PM.png?width=532&name=image-png-Apr-26-2021-11-09-32-21-PM.png)**

**Electrochemical Technology Applied**

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