JSR Chemical Cleaning Solutions with low particle and high-quality raw materials provide the state-of-the-art Cleaning technology which high selective etch or cleaning is required on Metal / Non-Metal layers.
Example Application of JC-001A
Residue Removability
Complete Residue Removal
Defectivity
> 19nm Wafer Particle
< 10 Counts/Wafer
Metal Compatibility
Corrosion Inhibitor Selection
Corrosion Potential Control
Electrochemical Technology Applied