Advance Cleans - Post Etch Cleans

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JSR Chemical Cleaning Solutions with low particle and high-quality raw materials provide the state-of-the-art Cleaning technology which high selective etch or cleaning is required on Metal / Non-Metal layers.    

 

Example Application of JC-001A


Residue Removability

Complete Residue Removal


Defectivity

> 19nm Wafer Particle 

< 10 Counts/Wafer


Metal Compatibility

Corrosion Inhibitor Selection

Corrosion Potential Control

Electrochemical Technology Applied