Advance Cleans - Post Etch Cleans

Request info

JSR Chemical Cleaning Solutions with low particle and high-quality raw materials provide the state-of-the-art Cleaning technology which high selective etch or cleaning is required on Metal / Non-Metal layers.    


Example Application of JC-001A

Residue Removability

Complete Residue Removal


> 19nm Wafer Particle 

< 10 Counts/Wafer

Metal Compatibility

Corrosion Inhibitor Selection

Corrosion Potential Control

Electrochemical Technology Applied