JSR delivers various Slurries for CMP processes by integrating the design, technology, and manufacturing of various liquid-based solutions. This helps to provide a wide range of process windows with selective polishing control on specific layers.
TEM Image of Abrasive
Low Defectivity with Mono-Dispersed Colloidal Silica
Frequency and Particle Size
Typical Value of a Slurry
Defective Data
Removal Rate Knob
Good Dispersion Technique for Good Defectivity and Controllable Removal Rate Knob
Defectivity Results With and Without
ζ-Potential of Slurry with Additives
Removal Rate Knob
Stain After Ru CMP
Silica: High Ru Removal Rate
Titania: Hi Ru/TEOS Selectivity without Stain