ArF immersion

Request info
  • Leading the pack
  • Cutting edge lithography
  • Low LWR
  • Low defectivity
  • Low MEEF (mask error enhancement factor)

JSR ArF Immersion Photoresist with Dual HM

JSR ArF Immersion Photoresist with Dual HM

JSR ArF Non-Topcoat Immersion Photoresist

JSR ArF Non-Topcoat Immersion Photoresist

Advanced Non-TC Immersion Resist

Advanced Non-TC Immersion Resist