ArF & KrF Dry Imaging

• Leading edge lithography
• Robust process latitude
• Low defectivity
• Excellent quality control
• Low LWR
• Low MEEF
• Enhanced resolution to extend CoO of existing tool sets

ArF dry lithography - L/S

LWR improvement

ARX series - 60nm L/S - ASML /1400 (0.93NA)

High-Speed ArF Photoresist

Advanced KrF Solutions - M series

250nm CD, 630nm FT

EL, 250nm CD, 770nm FT