Inpria Co-Developing Metal Oxide Resist with SK hynix to Reduce Complexity of Patterning for Next-Generation DRAM
JSR Corporation announced today acceleration of its co-development with SK hynix Inc. to apply Inpria, a JSR company’s Extreme Ultraviolet (EUV) metal oxide resist (MOR) for manufacturing advanced DRAM chips. Inpria’s broadly-patented metal oxide photoresist platform for EUV enables customers to efficiently pattern advanced node device architectures.