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Technical Papers

Technical papers published here are provided for general informational purposes only and should not be interpreted as providing a guarantee of performance, or an endorsement of particular technology pathways. For more detailed information regarding JSR Micro product development and technologies, contact your JSR Micro representative.
Advanced CMP Consumables for 32nm generation (149 KB) August 2007
ArF Line Slimming during SEM Measurement (149 KB)
ArF Resist Design for All Alicyclic Platforms (1 MB)
ArF Resist Design and Performance (1.5 MB)
CMP Defect Reduction by Pad Design and particle Engineering (959 KB)
CMP Slurry Surfactants Effects on the Fracture of Nanoporous Methylsilsesquioxane Thin-Film Glasses (517 KB)  
Design and Performance of 193 nm PAGs (320 KB)  
Half Tone Resist Design for I-Line (1.2 MB)  
JSR Pad Qualification for Oxide and Poly CMP Applications (879 KB)  
Methods for Determination of CMP Pad Life: Simulation by Conditioning vs. Wafer Passes (256 KB)  
Nonionic Surfactants Effects on the Fracture of Nanoporous Methylsilsesquioxane Thin-Film Glasses (310 KB)  
Pattern Shortening Simulation (128 KB)  
Pattern Shortening Resist Design for I-Line (896 KB)  
Simulation Issues for I-Line (7.3 MB)
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