Latest Releases
March 13, 2008 |
CONTACT:
JSR Corporation
Yoshiko Takeda
81-3-5565-6519
yoshiko_takeda@jsr.co.jp |
JSR Micro
Missy Bindseil
1-830-237-9527
mbindseil@jsrmicro.com |
JSR introduces new lithography materials for semiconductor manufacturing
~Double patterning for 22nm node made realistic~ |
JSR announced today that it has achieved 32nm line and space patterns for 22nm node semiconductor devices by using a new “freezing material” for double patterning. The results were presented at the “SPIE Advanced Lithography 2008” technical conference held February 24-28.
Double patterning, such as double exposure/double etch or double exposure/single etch, are promising methods for processes at the 22nm node.
JSR has developed its new “freezing material” for the double exposure/single etch process to achieve finer pitches. JSR worked with IMEC (Europe's leading independent research center in the field of micro- and nanoelectronics, nanotechnology, enabling design methods and technologies for ICT systems) for the evaluation.
JSR’s “freezing material” is designed to prevent the first resist material from mixing into the solvent of the second resist material by hardening the surface of the 1st resist material. By using this material, it may make the most wanted double patterning process achievable.
This evaluation was conducted within IMEC’s advanced lithography industrial affiliation program (IIAP) as part of IMEC's sub-32nm CMOS research platform, which is IMEC's premium R&D cooperation platform focused on research and development for 32nm~22nm logic LSI, memory devices semiconductor manufacturing. All evaluation took place at IMEC’s facilities.
In addition to JSR’s freezing material for double patterning, the company’s photoresists, topcoat materials and non-topcoat resists for immersion lithography are being used in this program and are showing promising results for mass production processes.
JSR is committed to maintaining its position as a leading materials supplier to the semiconductor industry and hopes that cooperative research and development like this will give the company the ability to respond quickly to market needs with solutions creating tomorrow’s devices.
###
|
Back |
Copyright © JSR Micro, Inc.
(1995-2004) All Rights Reserved.
|
