SUNNYVALE, California
February 20, 2006
SUNNYVALE, Calif. – February 20, 2006 – JSR Corporation of Tokyo, and its US operations, JSR Micro, Inc., announced today that it has, through a long-standing partnership with IBM, further advanced the viability of immersion lithography by successfully demonstrating sub-30nm patterning. The 29.9nm 1:1 patterns were created using JSR’s high refractive index liquid as the immersion fluid and ArF photoresist in conjunction with IBM’s high index optical element on its NEMO immersion lithography tool.
“These results clearly demonstrate that high index immersion lithography can take the IC industry beyond the 32nm node without using extreme lithography techniques,” said Dr. Robert D. Allen, manager of lithography materials, at IBM’s Almaden Research Center. “At IBM, we are committed to our partnership with JSR and to leading immersion lithography science and materials technology.”
JSR’s SOLOnX technology, a platform based on its high refractive index fluid, has had strong success in extending the limits of ArF lithography systems. Preliminary results are showing viable results sooner than potentially competing technologies.
“We believe that the introduction of high refractive index liquid imaging will enable the extension of ArF lithography over two technology nodes,” said Mark Slezak, technical manager of JSR Micro, Inc. “As an industry we face tough resourcing questions about which lithography technology is going to allow us to be successful at the next manufacturing node. This gives us another data point for making those decisions.”
JSR is developing new materials for advanced lithography technologies such as spin-on hardmask materials, top coating materials for immersion lithography and ArF resist for high NA dry and immersion exposure.
About JSR Corporation (www.jsr.co.jp)
Tokyo-based JSR Corporation is an innovative materials supplier for leading semiconductor companies. JSR Corporation advances industry efforts by developing superior semiconductor materials, including advanced photoresists, low k dielectrics, CMP consumables and packaging and assembly materials. JSR Corporation employs approximately 4,400 employees worldwide.
About JSR Micro, Inc. (www.jsrmicro.com)
A global supplier for leading semiconductor manufacturers, JSR Micro designs and produces advanced materials for the semiconductor industry, including high performance photoresists, immersion materials, CMP consumables, low-k dielectrics and packaging materials.
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