JSR Corporation (Tokyo, Japan) - August 4, 2008 - has received the Achievement Award from Advanced Micro Devices (Sunnyvale, California) for outstanding performance in providing products and services deemed essential to AMD’s success.

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TOKYO, Japan, March 17, 2008 – JSR Corporation was named a recipient of Intel Corporation’s 2007 Preferred Quality Supplier (PQS) award for outstanding performance in providing products and services deemed essential to Intel’s success. The company is awarded for its efforts supplying Intel with advanced photoresists, packaging materials and CMP consumables. JSR Corporation and 34 additional PQS award winners will be honored at a celebration in Burlingame, California on March 18.

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JSR announced today that it has achieved 32nm line and space patterns for 22nm node semiconductor devices by using a new “freezing material” for double patterning. The results were presented at the “SPIE Advanced Lithography 2008” technical conference held February 24-28.

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SUNNYVALE, Calif. – December 7, 2007 –JSR Micro, Inc., the US operations of JSR Corporation of Tokyo, Japan, announced today that it has entered a joint research agreement with IBM to explore new technologies for emerging semiconductor materials and processes.

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Tokyo – July 20, 2007 – JSR Corporation has announced that Bruno Roland takes the position of president of JSR Micro NV, a 100 percent subsidiary located in Belgium, effective June 15, 2007. The company expects to accelerate its globalization by establishing a local management team. This follows a precedent set by the company’s US operations, JSR Micro, Inc., that is successfully headed by Eric Johnson since 2005.

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SUNNYVALE, Calif. – February 20, 2006 – JSR Corporation of Tokyo, and its US operations, JSR Micro, Inc., announced today that it has, through a long-standing partnership with IBM, further advanced the viability of immersion lithography by successfully demonstrating sub-30nm patterning.  The 29.9nm 1:1 patterns were created using JSR’s high refractive index liquid as the immersion fluid and ArF photoresist in conjunction with IBM’s high index optical element on its NEMO immersion lithography tool. 

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SUNNYVALE, California ‹ June 7, 2005‹ JSR Micro, Inc., the Sunnyvale-based, U.S. operations for JSR Corporation of Tokyo, Japan, has promoted two of its own. Effective June 17, Eric R. Johnson will take over as president of the company and Mark Dennen will expand his responsibilities as vice president of sales. Prior to these promotions, Johnson served as chief operating officer and Dennen as national sales manager.

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TOKYO - Monday, November 29, 2004 - JSR Corporation announced today that it has successfully demonstrated 32nm line and space patterns using an ArF immersion lithography system and the company's high refractive index solution, developed based on its SOLOnX technology. Thirty-two
nanometers is commonly thought to be beyond the capability of water-based ArF immersion systems. JSR believes the introduction of a high refractive index (high n) liquid will extend ArF lithography over two technologies nodes.

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Sunnyvale, Calif. May 13, 2004 -- JSR Micro, Inc., the North America-based operations of Tokyo-based JSR Corporation, announced today that it’s CMP applications lab has been completed and is fully operational. The facility represents an investment of more than $5 million US dollars and will serve as the primary location for support for customers throughout the US and Europe.

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TOKYO, Japan, March 22, 2004 -- JSR Corporation was named a recipient of Intel Corporation’s Preferred Quality Supplier (PQS) award for outstanding performance in providing products and services deemed essential to Intel’s success. The company was awarded for its efforts in supplying Intel with photoresist and CMP pads. JSR Corporation and 28 additional PQS award winners will be honored at a celebration in Burlingame, Calif., on March 23.

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AUSTIN, Texas, April 3, 2003 -- AUSTIN, Texas —Under a supplier agreement between International SEMATECH (ISMT) and JSR Micro, Inc., 300mm test wafers developed with JSR LKD-5109 have been made available for etch, clean, deposition and CMP studies. The wafers will be offered to semiconductor companies through ISMT on a limited basis.

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Yokkaichi, Japan, December 4, 2002 -- JSR Corporation announced today that construction of its manufacturing facility for chemical mechanical planarization (CMP) polishing pads will be completed on December 18, 2002 and be fully commercialized in 2003. The initial manufacturing capacity of the facility will be 40,000 pads per year with room for future expansion.

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LEUVEN, BELGIUM, November 20, 2002 -- JSR Micro NV, a wholly-owned subsidiary of Tokyo-based JSR Corporation, announced today that construction of its newest semiconductor materials manufacturing facility in Leuven, Belgium, has been completed. The facility represents an investment of 2.5 billion yen — approximately 21 million US dollars — and is scheduled to begin production by the end of this year.

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SUNNYVALE, California, October 1, 2002 -- JSR Microelectronics, Inc., the Sunnyvale-based U.S. operation of JSR Corporation of Tokyo, Japan, announced today that it will now be known as JSR Micro, Inc. The company has also adopted a new logo and the tagline Materials Innovation™.

Materials Innovation conveys the company’s operating philosophy. JSR Micro will continue to serve as a partner to its customers and to compete on the leading edge of advanced photoresists, low-k dielectrics, CMP consumables and other fine chemicals.

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