Latest Releases
About JSR Micro, Inc.
A global supplier for leading semiconductor manufacturers, JSR Micro designs and produces advanced materials for the semiconductor industry, including high performance photoresists, CMP consumables, low-k dielectrics and packaging materials.
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JSR and Tri Chemical Enter Comprehensive Alliance
March 19, 2009 – Tokyo, Japan – JSR Corporation announced today that it has entered into a comprehensive business alliance with Tri Chemical Laboratories Inc. for development, production and sales of raw materials for semiconductors. In April 2008, JSR Corporation acquired 19.2 percent of Tri Chemical Laboratories shares.
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03/19/2009 |
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JSR and IBM Collaborate to Provide Cost-Effective Semiconductor Materials Solutions for 32nm and 22nm Technology Nodes
SUNNYVALE, Calif. – February 19, 2009 –JSR Corporation, along with its US operations, JSR Micro, Inc, announced today that it has entered into several joint development partnerships with IBM to develop new materials and processes for 32nm and 22nm nodes of semiconductor technology.
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02/19/2009 |
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JSR Micro NV receives Achievement Award from AMD
JSR Corporation (Tokyo, Japan) - August 4, 2008 - has received the Achievement Award from Advanced Micro Devices (Sunnyvale, California) for outstanding performance in providing products and services deemed essential to AMD’s success.
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08/04/2008 |
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JSR CORPORATION RECEIVES INTEL’S
PREFERRED QUALITY SUPPLIER AWARD
TOKYO, Japan, March 17, 2008 – JSR Corporation was named a recipient of Intel Corporation’s 2007 Preferred Quality Supplier (PQS) award for outstanding performance in providing products and services deemed essential to Intel’s success. The company is awarded for its efforts supplying Intel with advanced photoresists, packaging materials and CMP consumables. JSR Corporation and 34 additional PQS award winners will be honored at a celebration in Burlingame, California on March 18.
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03/17/2008 |
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JSR introduces new lithography materials for semiconductor manufacturing
~Double patterning for 22nm node made realistic~
JSR announced today that it has achieved 32nm line and space patterns for 22nm node semiconductor devices by using a new “freezing material” for double patterning. The results were presented at the “SPIE Advanced Lithography 2008” technical conference held February 24-28.
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03/13/2008 |
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JSR and IBM Collaborate on Next-Generation Semiconductor Materials, Self-Assembly
SUNNYVALE, Calif. – December 7, 2007 –JSR Micro, Inc., the US operations of JSR Corporation of Tokyo, Japan, announced today that it has entered a joint research agreement with IBM to explore new technologies for emerging semiconductor materials and processes.
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12/07/2007 |
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JSR announces New President of European Operation
Tokyo – July 20, 2007 – JSR Corporation has announced that Bruno Roland takes the position of president of JSR Micro NV, a 100 percent subsidiary located in Belgium, effective June 15, 2007. The company expects to accelerate its globalization by establishing a local management team. This follows a precedent set by the company’s US operations, JSR Micro, Inc., that is successfully headed by Eric Johnson since 2005.
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07/20/2007 |
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JSR’s High Index Liquid and IBM Optics Create
sub-30nm 1:1 Lines
SUNNYVALE, Calif. – February 20, 2006 – JSR Corporation of Tokyo, and its US operations, JSR Micro, Inc., announced today that it has, through a long-standing partnership with IBM, further advanced the viability of immersion lithography by successfully demonstrating sub-30nm patterning. The 29.9nm 1:1 patterns were created using JSR’s high refractive index liquid as the immersion fluid and ArF photoresist in conjunction with IBM’s high index optical element on its NEMO immersion lithography tool.
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02/20/2006 |
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JSR Micro, Inc. Names New President and VP of Sales
SUNNYVALE, California ‹ June 7, 2005‹ JSR
Micro, Inc., the Sunnyvale-based, U.S. operations for
JSR Corporation of Tokyo, Japan, has promoted two of
its own. Effective June 17, Eric R. Johnson will take
over as president of the company and Mark Dennen will
expand his responsibilities as vice president of sales.
Prior to these promotions, Johnson served as chief operating
officer and Dennen as national sales manager.
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06/07/2005 |
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JSR Proves Second Generation Immersion Lithography to Knock-out F2 Possibility
TOKYO - Monday, November 29, 2004 - JSR Corporation announced today that it has successfully demonstrated 32nm line and space patterns using an ArF immersion lithography system and the company's high refractive index solution, developed based on its SOLOnX technology. Thirty-two
nanometers is commonly thought to be beyond the capability of water-based ArF immersion systems. JSR believes the introduction of a high refractive index (high n) liquid will extend ArF lithography over two technologies nodes.
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11/29/2004 |
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JSR Micro's CMP Applications Lab Fully Operable
Sunnyvale, Calif. May 13, 2004 -- JSR Micro, Inc., the North America-based operations of Tokyo-based JSR Corporation, announced today that it’s CMP applications lab has been completed and is fully operational. The facility represents an investment of more than $5 million US dollars and will serve as the primary location for support for customers throughout the US and Europe.
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05/13/2004 |
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JSR Corporation Wins Intel's Preferred Quality Supplier Award
TOKYO, Japan, March 22, 2004 -- JSR Corporation was named a recipient of Intel Corporation’s Preferred Quality Supplier (PQS) award for outstanding performance in providing products and services deemed essential to Intel’s success. The company was awarded for its efforts in supplying Intel with photoresist and CMP pads. JSR Corporation and 28 additional PQS award winners will be honored at a celebration in Burlingame, Calif., on March 23.
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03/22/2004 |
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300mm Test Wafers with JSR LKD-5109
Low-k Dielectric Made Available Through International
SEMATECH
AUSTIN, Texas, April 3, 2003 -- AUSTIN, Texas —Under a supplier
agreement between International SEMATECH (ISMT) and
JSR Micro, Inc., 300mm test wafers developed with JSR
LKD-5109 have been made available for etch, clean, deposition
and CMP studies. The wafers will be offered to semiconductor
companies through ISMT on a limited basis.
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04/03/2003 |
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JSR Completes Construction of CMP Pad Manufacturing Facility
Yokkaichi, Japan, December 4, 2002 -- JSR Corporation announced today that construction
of its manufacturing facility for chemical mechanical
planarization (CMP) polishing pads will be completed
on December 18, 2002 and be fully commercialized in
2003. The initial manufacturing capacity of the facility
will be 40,000 pads per year with room for future expansion.
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12/04/2002 |
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JSR Micro Group Completes Construction of Belgian
Facility - New Plant to Bolster Global Network in Asia,
North America and Europe
LEUVEN, BELGIUM, November 20, 2002 -- JSR Micro NV, a wholly-owned
subsidiary of Tokyo-based JSR Corporation, announced
today that construction of its newest semiconductor
materials manufacturing facility in Leuven, Belgium,
has been completed. The facility represents an investment
of 2.5 billion yen — approximately 21 million
US dollars — and is scheduled to begin production
by the end of this year.
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11/20/2002 |
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A New Name in Semiconductor Materials -
JSR Microelectronics, Inc. is now JSR Micro, Inc.
SUNNYVALE, California, October 1, 2002 -- JSR Microelectronics,
Inc., the Sunnyvale-based U.S. operation of JSR Corporation
of Tokyo, Japan, announced today that it will now be
known as JSR Micro, Inc. The company has also adopted
a new logo and the tagline Materials Innovation™.
Materials Innovation conveys the company’s operating
philosophy. JSR Micro will continue to serve as a partner
to its customers and to compete on the leading edge
of advanced photoresists, low-k dielectrics, CMP consumables
and other fine chemicals.
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10/01/2002 |
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(1995-2004) All Rights Reserved.
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