The Company

JSR Micro, Inc. is an innovation partner to its customers - working directly with leading IC manufacturers on materials solutions to enable attainment of the next level on the ITRS roadmap. In the North American market, JSR Micro serves customers through a state-of-the-art development, testing and manufacturing site in Sunnyvale, California. Our 14-acre campus features advanced photoresist manufacturing supported by 300mm equipment in addition to a class-10 CMP applications lab. The facility is fully equipped and staffed to provide real-time analysis and monitoring, flexible volumes and compliance exceeding ISO requirements.

JSR Micro employs more than 130 people; located at the company's Sunnyvale campus and in sales offices throughout the U.S.

Innovation One-on-One
We are in the business of delivering individualized materials solutions. Our approach is Innovation One-on-One - discovering and adapting product technologies to fit specific customer requirements.

History:

•  1957 - December - Company founded as Japan Synthetic Rubber Co., Ltd. in Tokyo, Japan

• 1991 - JSR Microelectronics opens its first technical application support lab for i-line

• 1993 - July - UCB-JSR Electronics S.A. (Belgium) became a wholly-owned subsidiary of Japan Synthetic Rubber and opened after being renamed JSR Electronics N.V. Simultaneously; JSR Microelectronics, Inc. acquired the U.S. operations as their subsidiary.

• 1996 - Grand Opening of Sunnyvale, CA facility

• 1997 - March - Construction work was completed for JSR Microelectronics, Inc photoresist production plant in Sunnyvale, CA.

• 1997 - ISO9000 Certification received

• 1997 - December - Japan Synthetic Rubber changes its name to JSR Corporation.

• 1998 - 0.6 NA KrF stepper was installed and production of KrF resists began

• 1999 - Began production of anti-reflective coatings

• 1999 - April - High-performance planarization slurries for CMP launched for full-scale sales.

• 1999 - December - Launch of JSR LKD, an interlayer dielectric material, designed for advanced semiconductors.

• 2001 - Completed Phase II photoresist expansion including the addition of five vessels

• 2002 - October - JSR Microelectronics name is changed to JSR Micro, Inc.

• 2002 - JSR Corporation completes construction of new plant facilities for CMP polishing pads Yokkaichi, Japan.

• 2002 – ArF photoresist production begins in Sunnyvale

• 2004 – May – JSR Micro, Inc. completes construction of a class-10 CMP applications laboratory in Sunnyvale, CA.

• 2006 – October – Expansion of the CMP lab including the introduction of new slurry formulation capabilities. 

• 2006 – December – JSR Micro, Inc. upgrades its U.S. facilities with the purchase of a 300mm compatible ArF 0.85 NA scanner and  coater track.